Ion Source for Sample Cleaning in UHV

Ion Source for sample cleaning in UHV

Ion source for cleaning

The ISIS3000 ion source produces a high current, variable energy ion beam for the cleaning of sample surfaces in UHV. It is easily adapted to most UHV systems and is supplied complete with a power supply.

Features of the sample cleaning ion source

Good specifications at an attractive price.
Variable energy 100 - 3000 eV
High beam current even at low energy
Variable beam current for different kinds of samples.
Low beam energy for sensitive samples.
Higher beam energies for rapid etching.
Broad 10 mm spot - no rastering required
No differential pumping required - bolts directly to 70 mm flange.
Supplied with spacer collar to adjust working distance no extra cost.
May be used with any inert gas leaked directly into the source -no need to backfill your chamber.

Description of the Ion source
The ion source comprises an oscillating electron discharge source with electrostatic extraction and focusing lens. Inert gas is leaked directly into the discharge chamber where ions are formed at a selected energy of between 100 and 3000 eV. The ions are extracted and focused into a spot of approximately 10 mm diameter at the sample surface where the impact of the energetic ions physically removes surface material thus cleaning the sample.
The gun has a simple rugged design and includes dual filaments to extend in vacuum serviceability. The electronics are 19 inch rack mounting and provide clear analogue metering of beam energy, filament and discharge current.

Specifications

Source		Electronics
Beam Energy	100 -3000 eV	Ion Energy variable	0-3000 eV
Beam Current	Typically 15 uA	Focus potential	0 -100%
Filament	Dual Tungsten/Thorium	Filament current	0 to 4 A
Mounting Flange	70 mm OD CF port	Anode potential	0 -100%
Working Distance	50 to 150 mm	Discharge current metering 0 -100 mA
Sample to Flange	up to 310 mm	Select filament 1, 2 or OFF
Gas inlet flange	34 mm OD CF	The source can be run in discharge current metering stabilized mode for safe unattended operation.
Spot size at sample	~ 10 mm
Operating pressure	Typically 5 x 10e-6 mbar ( depending on pumping speed in the vacuum chamber.)

Schematic of the ISIS3000 ion source

Ordering Information

Model No	Description
ISIS3000	Ion source complete with electronic control unit, source cable, spare filament assembly and instructions

PSP Vacuum Technology
Unit 8 Heather Close
Lyme Green Business Park
Macclesfield SK11 OLR
United Kingdom
Tel: +44 (0)1625 500154
Fax +44 (0)1625 619463

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